It looks like you're new here. If you want to get involved, click one of these buttons!
Hello all,
I am using XSection1.4 with Klayout0.26.7 on wondows10.
I am scripting the .xs file for structures that involve the growth of thick layers (>1µm) and deep etches.
I cannot find a way to grow/deposit a layer thicker than 1um. If the layer is too thick, the geometric shape gets truncated and I cannot etch into it afterwards.
Here is a basic script to reproduce the issue: (I have also joined my .xs file in .txt format)
# basic
substrate = bulk
l_1 = layer("2/0")
#some thick layer growths
test1 = deposit(0.5)
test2 = deposit(1.0)
test3 = deposit(2.0)
mask(l_1).etch(1, :into => [test1, test2, test3])
#build my drawing
output("300/0", substrate)
output("301/0", test1)
output("302/0", test2)
output("303/0", test3)
This image is what happens when running the script above:
the last layer (in lime green) should be 2.0µm but is only 0.5µm, and the etch step doesn't happen. There seems to be a point above z=1.0um, where structures just stop drawing.
I've tried changing the grid size using delta(5 * dbu)
but it has not changed anything.
Has this ever been noticed or am I doing something wrong ?
Many thanks for your attention if you've read this far.
MR
Comments
Hello,
The height of the processing window is 2um by default. You can increase it by adding the next line at the top of your script:
height(10) # 10um, or more if needed...
Cheers,
Tomas
Hello Tomas,
Thank you for your quick and spot on answer ! This right about solves my problem.
I most definitely looked over the
below, depth and height functions
section in the XS File Reference.All the best,
MR.